首頁 > 產(chǎn)品展示 > 真空鍍膜設備 >
型 號 Model |
ZZS600 | ZZS700 | ZZS800 | ZZS900 | ZZS1100 | ZZS1300 | ZZS1800 | ||
真空室尺寸(直徑×高) Size of the vacuum chamber (diameter× height) |
Φ600×750 | Φ710×850 | Φ800×900 | Φ900×1000 | Φ1100×1300 | Φ1300×1300 | Φ1800×2000 | ||
極限真空度 Ultimate vacuum degree |
≤3.0×10-4Pa | ||||||||
恢復真空時間 Time for vacuum recovery |
4.0×10-3Pa≤15min | ||||||||
抽氣系統(tǒng) Pumping system |
擴散泵 Diffusion pump | K-400 | TK-500 |
K-600
|
K-630 | TK-500×2 | K-630×2 | K-800×2 | |
羅茨泵 Roots pump | ZJP-150 | ZJP-300 | ZJP-300 | ZJP-1200 | |||||
機械泵 Mechanical pump | 2X-30 | 2X-70 | 2X-70 | 2X-70 | 2X-70 | 2X-70 | 2X-70,H-150×2 | ||
真空測量系統(tǒng) Vacuum measuring system |
配三路數(shù)字復合真空計,兩路低真空,一路高真空 Three-way digital compound vacuum gauge, two ways of low vacuum and one of high vacuum |
||||||||
操作方式 Operation mode |
手動/自動 Manual/automatic |
||||||||
工件夾具 Work piece holder |
Φ600 | Φ640 | Φ750 | Φ840 | Φ1040 | Φ1240 | Φ1720 | ||
工件烘烤系統(tǒng) Work piece baking system |
上烘烤,鎧裝管狀加熱器加熱,******溫度350℃,PID自動控溫及顯示 Up baking; heated by sheathed tubular heating element; maximum temperature 350℃; PID automatic temperature control and display. |
||||||||
蒸發(fā)源 Evaporation source |
電阻蒸發(fā)源 Resistance evaporation source |
電阻蒸發(fā)源功率4KW(8V、600A) Power of the resistance evaporation source: 4KW (8V, 600A) |
|||||||
電子束蒸發(fā)源 Electron beam evaporation source |
E型電子束蒸發(fā)源,功率6~10KW Power of E-type electron beam evaporation source: 6-10KW |
||||||||
膜厚監(jiān)控系統(tǒng) Monitoring system on depth of films |
光學膜厚監(jiān)控,波長范圍380-800nm,9o透反射光路,六位電動比較片帶顯示;石英晶體膜厚監(jiān)控,美國SQC-310、IC/6 The optical film thickness monitor, a wavelength range of 380-800nm, 9otransflective optical path, six electric comparison sheet with display; quartz crystal thickness monitoring, the United States SQC-310, IC / 6 |
||||||||
充氣系統(tǒng) charge systems | 自動壓強儀2~510-2Pa Automatic pressure instrument |
||||||||
質(zhì)量流量計:單路單顯,雙路雙顯 Mass flow meter: one way one display, dual way dual display |
|||||||||
離子輔助(選配) Ion-assisted (optional) |
H6霍爾離子源、H10霍爾離子源、Φ12cm考夫曼離子源、Φ16cm考夫曼離子源 H6 Hall ion source, H10 Hall ion source, Φ12cm Kaufman ion source, Φ16cm Kaufman ion source |
||||||||
深冷捕集器(選配) Cryogenic trap (optional) |
國產(chǎn)12P、國產(chǎn)15P、進口POLYCOLD550、進口POLYCOLD670 Domestic 12P, 15P, POLYCOLD 550, POLYCOLD 670 |
||||||||
動力需求 Power demand |
冷卻水 Cooling water |
壓力溫度 Pressure and temperature |
壓力:0.25~0.35MPa;溫度≤25℃ Pressure: 0.25-0.35MPa; temperature ≤25℃ |
||||||
流量 Flow rate |
≥50L/min | ≥60L/min | ≥80L/min | ≥100L/min | ≥140L/min | ≥160L/min | ≥180L/min | ||
壓縮空氣 Compressed air |
壓力:0.5~0.7MPa Pressure: 0.5-0.7MPa |
||||||||
******消耗電力 Maximum power consumption |
~25KW | ~35KW | ~40KW | ~45KW | ~50KW | ~60KW | ~120KW | ||
設備外形尺寸(寬×深×高) Overall dimension (width×depth×height) |
2100×1800×2000 | 3350×2600×2370 | 3580×3000×2450 | 3870×3600×2670 | 3870×3600×2670 | 3900×4050×2950 | 4400×4000×3600 | ||
設備總重(KG) Gross weight (Kg) |
約1500 About 1,500 |
約2000 About 2,000 |
約2500 About 2,500 |
約3000 About 3,000 |
約3000 About 3,000 |
約4000 About 4,000 |
約6000 About 4,000 |
CopyRight 2016 Rankuum .All Rights Reserved. 蜀ICP備11017347號-1
成都南光機器有限公司
地 址:中國.成都經(jīng)濟技術開發(fā)區(qū)星光西路115號(610100)